日本YAMATO等离子清洗机PR300/301:
Low Temperature Asher |
PR300/PR301 |
| The PR 300 isagasplasma device that is used widely for suchapplicationsasproduction of semiconductors and analysis work.Itboastsoutstanding operabi lity and safety, with anautomatictuningsystem as a standard component and other features.It has acompactdesign, with a small-size HF generator and anoscillationsectionintegrated with a portion of the chamber,allowing it tobeinstalled into a 19-inch rack.
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The gas plasmaequipment has a wide range ofapplications fromashing, etching,dry cleaning,etc. |
Reaction Chamber | |
Control Panel | |
Operation Flowchart |
Piping System Diagram (PR300) |
Specifications | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
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